Small HiTUS®
source in a modular PVD chamber
Small Area Coating - HiTUS®
mounted onto a Korvus HEX panel
By separating plasma generation from the target, HiTUS®
offers more control than conventional magnetron sputtering
Features
- Utilises Plasma Quest's ' Remote Plasma Source'; remotely generated plasma means new coatings are achievable
- All integrated onto one of Korvus Technology's HEX panels
- High Target Utilisation – reducing waste and cost while improving coating quality and uniformity
- Uniform Target Erosion - no “race track” - stable high rate reactive process, no feedback required, cheaper and simpler process
- Facilitates Low Temperature Deposition - deposition onto plastic or other ‘delicate’ substrates
- Conformal coverage of uneven surfaces – with substrate bias option
We have partnered with Korvus Technology. View the webinar here:
Specifications
- All integrated onto one of Korvus Technology's HEX panel (as shown)
- 2" sputter target or 4" sputter target
- Up to 6" substrate
- Ultimate base pressure < 5.0 x 10-7 mbar
- Process pressure range: 8.0 x 10-4 to 2.0 x 10-2 mbar
- Up to 4 MFCs gas inlet channels with isolation valves
- Up to 600 W plasma power with remote plasma modified matching unit
- Up to 300 W target power pDC (RF option available)
Specifications can be customised – please contact us
Ordering Information
SKU |
Description |
Price |
K-2inch
|
2" HiTUS® source in a Korvus HEX System |
POA |
K4inch
|
4" HiTUS®
source in a Korvus HEX System
|
POA |