Magnetic Coatings
Plasma Quest’s remote plasma process provides substantial improvements in the sputtering of magnetic materials:
- High rate deposition of magnetic materials, including CoFe, NiFe, Co, Fe
- Excellent adhesion to glass, silicon, oxides and plastics
- Low stress films
- Grain size and thereby magnetic properties can be controlled through process modification
- Close to bulk material or theoretical ideal
- Ability to use thick magnetic targets – typically 6 mm
A standard deposition tool has been used to deposit a functioning multi-layer GMR structure of alternating Co (0.8 nm) and Cu (2.0 nm) thin films without the need for thickness monitoring.