Remote Plasma Source
Remote Plasma Source for sputtering, etching or plasma treatments
Enhanced deposition parameters without the expense of buying a complete new system.
Enabling High Target Utilisation Sputtering (HiTUS®), invented by Plasma Quest's CEO, Professor Mike Thwaites.
Features
Remotely generated plasma
- Does not require target bias to strike a plasma
- Enables new coatings
Plasma independent from target
Additional process parameters
Integrate into your existing system
Upgrade your existing system(s) more affordably; integrate the remote plasma source into your existing system or cluster tool
High target utilisation
- Achieves higher quality, uniform coatings
- Reducing waste and cost
HiTUS® - High Target Utilisation Sputtering
Plasma Quest's Remote Plasma Source enables the revolutionary HiTUS® technique, achieving 90% utilisation of material compared to conventional magnetron sputtering which achieves only 40% utilisation of material.
This brings huge material and cost savings (no racetrack).
Specifications
- Remote plasma source with remote plasma customised matching unit
- Up to 5 kW RF plasma power (13.56 MHz supply)
- HiTUS® launch and steering electromagnets and 2 of magnet power supplies
- Installation support
- 4” Plasma source (PLS100) for 4” substrate and below
- 6” Plasma source (PLS150) for 6” substrates and above
- Ultra high vacuum (PLS150CF) version available
All specifications can be customised – please contact us
Ordering Information
SKU | Description | Price |
PLS100 | 4” Plasma Source | POA |
PLS150 | 6” Plasma Source | POA |
PLS150CF | 6” Plasma Source – UHV version | POA |