Large Area Remote Plasma Source
Remote plasma source for sputtering, etching or plasma treatments onto large substrates
Install onto your batch coater / in-line system
Popular for photovoltaics application(s)
Features:
Remotely Generated Plasma
Enables new coatings
Integrate the remote plasma source into your existing system or cluster tool
Plasma independent from target
Additional process parameters
High target utilisation
Reducing waste and cost
Small target to substrate separation
High deposition rate
Specifications
- Remote plasma source with remote plasma customised matching unit
- Target assembly included (planar target)
- Up to 10 kW RF plasma power (13.56 MHz supply)
- Up to 10 KW target power pDC (RF option available)
- Remote Plasma electromagnets (2 off) and 2 off magnet power supplies
- Installation support
- Substrate width 1.2m
All specifications can be customised – please contact us
Ordering Information
SKU | Description | Price |
LPLS | Remote plasma large area source | POA |